The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 20, 2004
Filed:
Jul. 25, 2001
Applicant:
Inventor:
Tetsuo Taniguchi, Yokohama, JP;
Assignee:
Nikon Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B 2/742 ; G03B 2/754 ; G03B 2/772 ;
U.S. Cl.
CPC ...
G03B 2/742 ; G03B 2/754 ; G03B 2/772 ;
Abstract
A scanning exposure apparatus and method in which an interferometer, operatively connected to a stage holding a mask or a substrate, outputs a measurement value corresponding to positional information of the stage in the scanning direction. Start and stop timing of the output of trigger signals for the emission of pulses of an exposure beam emitted at predetermined time intervals is controlled based on the measurement value from the interferometer.
Taniguchi, Tetsuo. (2004). Projection exposure apparatus and method (U.S. Patent No. 6724463). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6724463
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