The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 20, 2004
Filed:
Dec. 23, 2002
Applicant:
Inventors:
Andrew D. Bailey, III, Pleasanton, CA (US);
Puneet Yadav, Fremont, CA (US);
Pratik Misra, Houston, TX (US);
Assignee:
Lam Research Corporation, Fremont, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01R 3/126 ; H01L 2/166 ; G01B 5/28 ; G01B 5/30 ; G06F 1/900 ;
U.S. Cl.
CPC ...
G01R 3/126 ; H01L 2/166 ; G01B 5/28 ; G01B 5/30 ; G06F 1/900 ;
Abstract
A system and method of for determining multiple uniformity metrics of a semiconductor wafer manufacturing process includes collecting a quantity across each one of a group of semiconductor wafers. The collected quantity data is scaled and a principal component analysis (PCA) is performed on the collected, scaled quantity data to produce a first set of metrics for the first group of semiconductor wafers. The first set of metrics including a first loads matrix and a first scores matrix.