The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 13, 2004
Filed:
Nov. 20, 2001
Applicant:
Inventors:
Xiaoming Chen, Austin, TX (US);
Charles H. Howard, Austin, TX (US);
Franklin Dean Kalk, Austin, TX (US);
Kong Son, Fremont, CA (US);
Paul Chipman, Pflugerville, TX (US);
Assignee:
DuPont Photomasks, Inc., Round Rock, TX (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06G 7/48 ;
U.S. Cl.
CPC ...
G06G 7/48 ;
Abstract
A method and apparatus evaluates the runability of a photomask inspection tool that inspects plural sets of die, each die having a standard simulated industrial device feature at plural technology nodes. A technology node size is determined for each feature at which inspection by the tool provides no false detection of faults. A sensitivity module included on a photomask test plate along with a runability module allows determination of inspection tool sensitivity and runability in a single test sequence.