The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 13, 2004
Filed:
Oct. 02, 2002
Hans H. Funke, Boulder, CO (US);
Dan Fraenkel, Boulder, CO (US);
Virginia H. Houlding, Boulder, CO (US);
Matheson Tri-Gas, Inc., Longmont, CO (US);
Abstract
Trace impurities such as organic compounds and carbon monoxide in reactive fluids such as ammonia, hydrogen chloride, hydrogen bromide, and chlorine are reduced to sub-ppb levels using gas purifying systems that contain a preconditioned ultra-low emission (P-ULE) carbon. P-ULE is capable of removing impurities from a reactive fluid down to parts-per-billion (ppb) and sub-ppb levels without concurrently emitting other impurities such as moisture or carbon dioxide into the purified reactive fluid. The P-ULE carbon is prepared by heating a carbon material to temperatures from 300° C. to about 800° C. in an ultra-dry, inert gas stream, to produce an ultra-low emission (ULE) carbon material, subjecting the ULE carbon to a second activation process under a reactive gas atmosphere to produce a P-ULE carbon and storing the P-ULE carbon in an environment that minimizes contamination of the P-ULE prior to its use in a gas purifier system.