The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 13, 2004
Filed:
Sep. 10, 2002
Koji Tsunekawa, Hachioji, JP;
Daisuke Nakajima, Tachikawa, JP;
Anelva Corporation, Tokyo, JP;
Abstract
A production method of the present invention is a method of producing a spin valve type giant magnetoresistive thin film. In this production method, a buffer layer, an antiferromagnetic layer, a fixed magnetization layer, a nonmagnetic conductive layer, a free magnetization layer, and a protective layer are consecutively stacked on a substrate. Furter, plasma treatment is performed on predetermined stacked interfaces in the spin valve type giant magnetoresistive thin film to reduce the interlayer coupling magnetic field acting between the fixed magnetization layer and the free magnetization layer and to obtain a high MR ratio. The above production method can achieve both of the high MR ratio and low interlayer coupling magnetic field (Hin) in the thin film produced.