The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 23, 2004
Filed:
Oct. 31, 2002
Motorola, Inc., Schaumburg, IL (US);
Abstract
A method ( ) to manufacture semiconductor reticles associated with a design uses an optical pattern correction (OPC) test pattern ( ) in a first reticle frame and having subresolution features that will not resolve or appear on a resulting wafer. A first reticle is made ( ) and critical parameters are extracted from the first reticle ( ). The critical parameters are used to execute an OPC model ( ) to generate a modified design. A production reticle is made from the modified design. The OPC test pattern is placed in a second reticle frame and a second reticle is manufactured. Critical parameters from the second reticle are compared with the critical parameters from the first reticle and must be within a predetermined tolerance or the reticle build process is modified until the tolerance is reached.