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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 6706613 B1

PDFFull Text
Date of Patent:
Mar. 16, 2004

Filed:

Feb. 06, 2003

Methods for manufacturing stacked gates including oxide/nitride/oxide (ono) interlayer dielectrics using pre-annealing and/or post-annealing in nitrogen

Applicant:
Inventors:

Young-Sub You, Gyeonggi-do, KR;

Hun-Hyeoung Lim, Gyeonggi-do, KR;

Sang-Hoon Lee, Seoul, KR;

Woo-Sung Lee, Gyeonggi-do, KR;

Assignee:

Samsung Electronics Co., Ltd., , KR;

Attorney:

Myers Bigel Sibley & Sajovec

Primary Examiner:

David Nelms

Assistant Examiner:

David Vu

Int. Cl.
CPC ...
H01L 2/176 ;
U.S. Cl.
CPC ...
H01L 2/176 ;
Abstract

A semiconductor device including a stacked gate having stacked gate sidewalls and an oxide/nitride/oxide (ONO) interlayer dielectric is manufactured by pre-annealing the stacked gate in a first atmosphere that includes nitrogen. At least a portion of the stacked gate sidewalls of the stacked gate that has been pre-annealed is oxidized. Post-annealing is then performed on the stacked gate including the stacked gate sidewalls that have been oxidized, in a second atmosphere that includes nitrogen.

Find Patent Forward Citations

You, Young-Sub. (2004). Methods for manufacturing stacked gates including oxide/nitride/oxide (ono) interlayer dielectrics using pre-annealing and/or post-annealing in nitrogen (U.S. Patent No. 6706613). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6706613

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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