The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 09, 2004
Filed:
Sep. 12, 2002
Applicant:
Inventors:
Tsunehiro Nishi, Niigata-ken, JP;
Takeshi Kinsho, Niigata-ken, JP;
Koji Hasegawa, Niigata-ken, JP;
Satoshi Watanabe, Niigata-ken, JP;
Shigehiro Nagura, Niigata-ken, JP;
Assignee:
Shin-Etsu Chemical Co., Ltd., Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/004 ; C08F 3/600 ;
U.S. Cl.
CPC ...
G03F 7/004 ; C08F 3/600 ;
Abstract
A polymer comprising recurring units of formulae (1) and (2) wherein R and R are H or methyl, R and R are C alkyl, R to R are H, or R and R , and R and R form trimethylene or 1,3-cyclopentylene and having a Mw of 1,000-500,000 is novel. A resist composition comprising the polymer as a base resin is sensitive to high-energy radiation, has excellent sensitivity, resolution and etching resistance and lends itself to micropatterning with electron beams or deep-UV.