The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 02, 2004

Filed:

May. 17, 2002
Applicant:
Inventors:

Torbjörn Sandström, Pixbo, SE;

Leif Odselius, Upplands Väsby, SE;

Peter Ekberg, Lidingö, SE;

Stefan Gullstrand, Danderyd, SE;

Mattias Israelsson, Stockholm, SE;

Ingvar Andersson, Stockholm, SE;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B41J 2/47 ; G01D 1/534 ; G02B 2/600 ; G02B 2/700 ;
U.S. Cl.
CPC ...
B41J 2/47 ; G01D 1/534 ; G02B 2/600 ; G02B 2/700 ;
Abstract

The present invention relates to a system and a method for microlithographic writing and inspection on photosensitive substrates, and specially printing and inspection of patterns with extremely high precision, such as photomasks for semiconductor device patterns, display panels, integrated optical, devices and electronic interconnect structures. More specifically the invention relates to compensation of substrate offset by modifying the position data or the feeding of the same of the deflector, and the use of a direct digital synthesis (DDS) unit for generation of the sweep frequency drive signal.


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