The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 17, 2004

Filed:

May. 23, 2001
Applicant:
Inventors:

Tetsuo Takahashi, Hyogo, JP;

Katsumi Nakamura, Hyogo, JP;

Tadaharu Minato, Hyogo, JP;

Masana Harada, Hyogo, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 2/976 ;
U.S. Cl.
CPC ...
H01L 2/976 ;
Abstract

A pin diode is formed by a p collector region, an n type buffer region, an n region and an n cathode region. A trench is formed from the surface of n cathode region through n cathode region to reach n region. An insulating film is formed along an inner wall surface of trench. A gate electrode layer is formed to oppose to the sidewall of n cathode region with insulating film interposed. A cathode electrode is formed to be electrically connected to n cathode region. An anode electrode is formed to be electrically connected to p collector region. The n cathode region is formed entirely over the surface between trenches extending parallel to each other. Thus, a power semiconductor device in which gate control circuit is simplified and which has good on property can be obtained.


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