The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 10, 2004
Filed:
May. 02, 2002
Jeremy Wu, Yunghe, TW;
Taiwan Semiconductor Manufacturing Company, Hsin-Chu, TW;
Abstract
The invention creates a grid of horizontal and vertical lines across a plane, the plane is the plane in which metal-1 is to be created. This plane overlies an (underlying) layer of metal, such as metal of a basic cell component, to which interconnects must be established by the metal-1 pattern. By using the coordinates of the intersects of the horizontal and the vertical lines, these intersects can be assigned attributes that indicate whether a particular intersect should or should not be connected to the underlying layer of metal. Using these attributes of the intersects of the imaginary metal grid, an intersect that can be interconnected with the underlying layer of metal can now be extended beyond that intersect, making a maximum pattern available for interconnect to a pin type in the underlying layer of metal. After the pattern of metal-1 has been created in this manner over the complete surface of the underlying layer of metal (of for instance a cell), the created metal-1 pattern can be analyzed for potential rule violations.