The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 13, 2004
Filed:
Sep. 18, 2000
Tohru Koyama, Tokyo, JP;
Renesas Technology Corp., Tokyo, JP;
Abstract
A method of and apparatus for analyzing a failure is provided. A laser beam generator ( ) has a plurality of laser beam sources differing in wavelength from each other. First, the laser beam generator ( ) generates a laser beam (B ) of about 1.1 &mgr;m in wavelength, and a failure analyzer ( ) stores therein a resultant first current image. Next, the laser beam generator ( ) generates a laser beam (B ) of about 1.3 &mgr;m in wavelength, and the failure analyzer ( ) stores therein a resultant second current image. Next, the laser beam generator ( ) generates a laser beam (B ) of not less than 2.0 &mgr;m in wavelength, and the failure analyzer ( ) stores therein a resultant third current image. The failure analyzer ( ) analyzes the cause and site of a failure in a sample ( ) by reference to the first to third current images stored therein. The method can diagnose and localize the failure in a chip by reference to only the current images obtained by the laser beam irradiation.