The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 30, 2003

Filed:

Feb. 15, 2002
Applicant:
Inventors:

Loris Vendrame, Carbonera, IT;

Paolo Ghezzi, Rivolta d'Adda, IT;

Assignee:

STMicroelectronics S.r.l., Agrate Brianza, IT;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 2/18238 ;
U.S. Cl.
CPC ...
H01L 2/18238 ;
Abstract

A bipolar transistor is produced by processes employed in the manufacture of CMOS nonvolatile memory devices, and is part of an integrated circuit. The integrated circuit includes a semiconductor substrate having a first type of conductivity, a PMOS transistor formed in said substrate, an NMOS transistor formed in said substrate, and the bipolar transistor. The bipolar transistor includes: a buried semiconductor layer having a second type of conductivity placed at a prescribed depth from the surface of said bipolar transistor, an isolation semiconductor region having the second type of conductivity, in direct contact with said buried semiconductor layer, and suitable for delimiting a portion of said substrate, forming a base region; an emitter region formed within said base region having the second type of conductivity, a base contact region of said transistor formed within said base region having the first type of conductivity, a collector contact region formed within said isolation semiconductor region having the second type of conductivity, wherein said base region has a doping concentration between 10 and 10 atoms/cm .


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