The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 30, 2003
Filed:
Apr. 23, 2001
Applicant:
Inventors:
Piero Sferlazzo, Marblehead, MA (US);
Chunghsin Lee, Lynnfield, MA (US);
Assignee:
Unaxis USA, Inc., St. Petersburg, FL (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 1/434 ; C23C 1/435 ; C23C 1/600 ;
U.S. Cl.
CPC ...
C23C 1/434 ; C23C 1/435 ; C23C 1/600 ;
Abstract
A deposition system is described. The deposition system includes a deposition source that generates deposition flux comprising neutral atoms and molecules. A shield defining an aperture is positioned in the path of the deposition flux. The shield passes the deposition flux through the aperture and substantially blocks the deposition flux from propagating past the shield everywhere else. A substrate support is positioned adjacent to the shield. A dual-scanning system scans the substrate support relative to the aperture with a first and a second motion.