The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 6665059 B1

PDF
Full Text
Expired
Date of Patent:
Dec. 16, 2003

Filed:

Feb. 13, 2001
Applicant:
Inventors:

Toshiyuki Kanno, Kawasaki, JP;

Eiji Ishibashi, Kawasaki, JP;

Toru Yoshizawa, Koganei, JP;

Yukitoshi Otani, Koganei, JP;

Assignee:

Fuji Electric Co., Ltd., Kanagawa, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01B 1/116 ;
U.S. Cl.
CPC ...
G01B 1/116 ;
Abstract

A measuring method capable of automatically analyzing quantitatively the inner state of a disk is provided. Linearly polarized light from a light source enters a retarder to produce a desired elliptically polarized state. The elliptically polarized light is then passed through a half-wave plate to rotate the direction of a principal axis of the ellipse. The light is expanded into two dimensions by lens systems and to obtain planar information, and is further transmitted through a disk substrate so that the birefringence of a specimen, which depends on an inner stress state and a polymer orientation state, changes the phase of the light. The light wave with its phase changed is passed through a polarizer arranged perpendicular to the principal axis of the retarder. The CCD detects the light wave as a light intensity.


Find Patent Forward Citations

Kanno, Toshiyuki. (2003). Method of measuring an inner stress state of disk substrate (U.S. Patent No. 6665059). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6665059

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