The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 16, 2003
Filed:
Jun. 29, 2001
Evelyn Barrington, Poughkeepsie, NY (US);
Jeffrey A. Brody, Hopewell Junction, NY (US);
Harry David Cox, Rifton, NY (US);
Lorraine Di Piero-Simmonds, Beacon, NY (US);
John J. Garant, Hopewell Junction, NY (US);
Dinesh Gupta, Hopewell Junction, NY (US);
Edward J. Hassdenteufel, III, New Windsor, NY (US);
Hsichang Liu, Fishkill, NY (US);
Paul G. McLaughlin, Poughkeepsie, NY (US);
Ahmed S. Shah, Wappingers Falls, NY (US);
Charles Timothy Ryan, Poughkeepsie, NY (US);
Richard C. Steger, New Windsor, NY (US);
John A. Trumpetto, Hopewell Junction, NY (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
A screening mask having a stress-relieving area including an inner functional area having a pattern which is replicated on an underlying substrate, the inner functional area pattern having an one open area through which a paste is extruded and at least one tab, and an outer nonfunctional area distinct from the inner functional area, the outer nonfunctional area having a stress-relieving area adjacent to an edge of the screening mask that protects the at least one tab in the inner functional area from breaking.