The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 16, 2003

Filed:

Dec. 11, 2001
Applicant:
Inventors:

Emir Gurer, Scotts Valley, CA (US);

Tom Zhong, Santa Clara, CA (US);

John W. Lewellen, San Jose, CA (US);

Eddie Lee, Cupertino, CA (US);

Assignee:

ASML Holdings, N.V., Veldhoven, NL;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
F26B 5/08 ;
U.S. Cl.
CPC ...
F26B 5/08 ;
Abstract

A process for drying a polymeric material present on a substrate is provided. Temperatures of the polymeric material is measured and the ambient temperature in the vicinity of the substrate. A temperature of the substrate is also measured. A variation in the measured ambient temperature is detected. The substrate temperature, polymeric temperature, ambient temperature or a substrate drying spin speed is adjusted in response to the detected variation in the measured ambient temperature.


Find Patent Forward Citations

Gurer, Emir. (2003). Method for two dimensional adaptive process control of critical dimensions during spin coating process (U.S. Patent No. 6662466). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6662466

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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