The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 02, 2003
Filed:
Aug. 22, 2001
Applicant:
Inventors:
Guenther Gerstmeier, Chapel Hill, NC (US);
Frank Richter, Dresden, DE;
Valentin Rosskopf, Poettmes, DE;
Assignee:
Infineon Technologies AG, Munich, DE;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 9/00 ;
U.S. Cl.
CPC ...
G03F 9/00 ;
Abstract
In a method for examining structures on a wafer, at least one mask, which is applied on the wafer and is fabricated by exposure processes, is used for fabricating the structures. Test circuits with test structures are placed on the mask in predetermined reference positions. In order to check the structures and/or the exposure processes, electrical parameters of the test circuits are detected and evaluated in a location-dependent manner.