The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 02, 2003
Filed:
Jun. 18, 2001
Applicant:
Inventors:
Norio Hasegawa, Nishitama, JP;
Toshihiko Tanaka, Tokyo, JP;
Joji Okada, Nishitama, JP;
Kazutaka Mori, Kokubunji, JP;
Ko Miyazaki, Kokubunji, JP;
Assignee:
Hitachi Ltd., Tokyo, JP;
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03F 9/00 ; G03F 7/00 ;
U.S. Cl.
CPC ...
G03F 9/00 ; G03F 7/00 ;
Abstract
In order to shorten the time required to change or correct a mask pattern over a mask, light-shielding patterns formed of a resist film for integrated circuit pattern transfer are partly provided over a mask substrate constituting a photomask in addition to light-shielding patterns formed of a metal for the integrated circuit pattern transfer.