The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 02, 2003

Filed:

Feb. 11, 2002
Applicant:
Inventors:

Kazuto Obuchi, Kanagawa, JP;

Kaoru Mizutani, Kanagawa, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C23C 1/600 ; H01L 2/100 ;
U.S. Cl.
CPC ...
C23C 1/600 ; H01L 2/100 ;
Abstract

For obtaining uniformity of processing by controlling difference in impedance between a plurality of processing chambers, in a plasma processing apparatus, a conductor of an attachment portion and a conductor of an attachment portion are connected via a small width portion , and therefore belt-like electrodes and are equal to each other in electrical potential. That is, the belt-like electrode and the belt-like electrode constitute a first electrode. Furthermore, to each of the belt-like electrodes and is applied high frequency power from a single high-frequency electric power supply through a cable , and the belt-like electrodes and are connected (or short-circuited) to each other by means of a belt-like conductor having a width substantially equal to that of the belt-like electrode


Find Patent Forward Citations

Loading…