The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 25, 2003
Filed:
Oct. 29, 2002
Kenneth J. Bruza, Alma, MI (US);
James P. Godschalx, Midland, MI (US);
Edward O. Shaffer, II, Midland, MI (US);
Dennis W. Smith, Jr., Seneca, SC (US);
Paul H. Townsend, III, Midland, MI (US);
Kevin J. Bouck, Midland, MI (US);
Qing Shan J. Niu, Midland, MI (US);
Dow Global Technologies Inc., Midland, MI (US);
Abstract
A suitable cross-linkable matrix precursor and a poragen can be treated to form a porous cross-linked matrix having a T of greater than 300° C. The porous matrix material has a lower dielectric constant than the corresponding non-porous matrix material, making the porous matrix material particularly attractive for a variety of electronic applications including integrated circuits, multichip modules, and flat panel display devices.