The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 18, 2003
Filed:
May. 08, 2001
Applicant:
Inventors:
Siegfried Mantl, Jülich, DE;
Ludger Kappius, Bad Wünnenberg, DE;
Qing-Tai Zhao, Jülich, DE;
Armin Antons, Jülich, DE;
Assignee:
Forschungszentrum Julich GmbH, Julich, DE;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 8/04 ;
U.S. Cl.
CPC ...
C23C 8/04 ;
Abstract
The invention relates to a method for producing a layer with a sub-micrometre structure on a substrate. First, a layer is formed on the substrate. Agents for creating elastic strains are then formed in at least one predetermined position on the layer and the layer is then subjected to a strain-dependent solid-state reaction. This results in material separating and consequently, in the layer being structured in this position.