The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 04, 2003
Filed:
Dec. 13, 2001
Applicant:
Inventors:
Stacy K. Firth, Austin, TX (US);
W. Jarrett Campbell, Austin, TX (US);
Assignee:
Yield Dynamics, Inc., Santa Clara, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06F 1/900 ;
U.S. Cl.
CPC ...
G06F 1/900 ;
Abstract
A system and method for controlling critical dimension in a semiconductor manufacturing process. The system controls critical dimension by altering focus and exposure settings, based on a single measured attribute (i.e., critical dimension) and on a process model equation. The system further systematically varies focus and exposure settings (e.g., by introducing variable deviation values), in order to provide unique and stable solutions for parameters within the process model equation.