The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 04, 2003
Filed:
Jun. 06, 2002
Applicant:
Inventor:
Tao Sun, Naperville, IL (US);
Assignee:
Cabot Microelectronics Corp., Aurora, IL (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B24B 1/00 ; C09G 1/02 ; C09G 1/04 ;
U.S. Cl.
CPC ...
B24B 1/00 ; C09G 1/02 ; C09G 1/04 ;
Abstract
The invention provides a chemical-mechanical polishing system, and a method of polishing using the system, comprising (a) an abrasive, a polishing pad, or both an abrasive and a polishing pad, (b) iodine, (c) an iodine vapor-trapping agent, and (d) a liquid carrier.
Sun, Tao. (2003). Cmp compositions containing iodine and an iodine vapor-trapping agent (U.S. Patent No. 6641630). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6641630
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile