The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 28, 2003

Filed:

Apr. 13, 2000
Applicant:
Inventor:

Tetsuo Ohara, Billerica, MA (US);

Assignee:

Nanowave, Inc., Billerica, MA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01B 1/124 ;
U.S. Cl.
CPC ...
G01B 1/124 ;
Abstract

An improved method of and apparatus for real-time continual nanometer scale position measurement by beam probing as by laser beams and the like, both fixed and oscillating or scanning, over an atomic and other undulating surface such as gratings or the like, relatively moving with respect to the probing beams; and providing, where desired, increased detection speeds, improved positioning sensing response, freedom from or relaxed requirements of strict control on probing oscillation amplitude, and multi-dimensional position measurement with focused beam probes and the like.


Find Patent Forward Citations

Ohara, Tetsuo. (2003). Method of and apparatus for real-time continual nanometer scale position measurement by beam probing as by laser beams and the like of atomic and other undulating surfaces such as gratings or the like relatively moving with respect to the probing beams (U.S. Patent No. 6639686). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6639686

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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