The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 21, 2003
Filed:
Mar. 08, 2000
Applicant:
Inventors:
Chih-Hsing Hsin, Hsinchu Hsien, TW;
Wen-Bin Shieh, Hsinchu Hsien, TW;
Assignee:
United Microelectronics Corp., Hsinchu, TW;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01B 1/100 ;
U.S. Cl.
CPC ...
G01B 1/100 ;
Abstract
A vernier having multi-pitch for checking alignment accuracy. The vernier has the same pitch as the line width of the IC pattern where the diffraction angle of the vernier is the same as that of the IC pattern. The pitch comprises slits which cannot produce image on the wafer, such that a simultaneous pattern with the conventional pattern on the wafer is formed. Accordingly, the alignment accuracy can be accurately checked, thereby monitoring the alignment of IC patterns.