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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 6636311 B1

PDFFull Text
Date of Patent:
Oct. 21, 2003

Filed:

Nov. 30, 1999

Alignment method and exposure apparatus using the same

Applicant:
Inventors:

Hideki Ina, Yokohama, JP;

Minoru Yoshii, Tokyo, JP;

Masanobu Hasegawa, Utsunomiya, JP;

Takashi Satoh, Utsunomiya, JP;

Assignee:

Canon Kabushiki Kaisha, Tokyo, JP;

Attorney:

Fitzpatrick, Cella, Harper & Scinto

Primary Examiner:

Frank G Font

Assistant Examiner:

Roy M Punnoose

Int. Cl.
CPC ...
G01B 1/100 ;
U.S. Cl.
CPC ...
G01B 1/100 ;
Abstract

An alignment method for aligning first and second objects, in an exposure apparatus for transferring a pattern of the first object onto the second object as being coated with a resist, includes a process of producing an alignment offset value related to an alignment mark forming region on the second object, after formation of the resist coating thereon, and a process of aligning the first object with the second object as being coated with the resist, in the exposure apparatus, on the basis of the offset value as produced.

Find Patent Forward Citations

Ina, Hideki. (2003). Alignment method and exposure apparatus using the same (U.S. Patent No. 6636311). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6636311

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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