The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 21, 2003
Filed:
Jan. 08, 2002
Jow-Feng Lee, Hsin-Chu, TW;
Taiwan Semiconductor Manufacturing Co., Ltd., Hsin Chu, TW;
Abstract
A method and apparatus for practicing the method is described for an in-situ wet polymer stripping process following an etching process, the method including, providing at least one solution container disposed outside the wafer cleaning chamber; providing at least one solution bath disposed within the wafer cleaning chamber; providing a solution in the at least one solution container; providing at least one fluidic pathway in communication with the at least one solution container and the at least one solution bath for supplying the solution to the at least one solution bath; controllably supplying the solution from the at least one solution container to the at least one solution bath; immersing the at least one process wafer into the at least one solution bath; and drying the at least one process wafer.