The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 21, 2003
Filed:
Aug. 18, 2000
Texas Instruments Incorporated, Dallas, TX (US);
Abstract
A method of reducing perfluorocarbon emissions wherein a plasma reactor or thermal chamber is provided and a gaseous single halogen-containing perfluorocarbon is entered into the reactor or thermal chamber. The perfluorocarbon is altered in the plasma reactor or thermal chamber to one of a bromine-containing and/or iodine-containing carbon species and expelled from the reactor or thermal chamber. The alteration includes entering into the plasma reactor or thermal chamber a species taken from the class consisting of iodine, bromine, hydrogen iodide, hydrogen bromide, bromocarbon compound and iodocarbon compounds. When the reactor is a thermal chamber, the temperature in the thermal chamber is at least 800° C. and the single halogen-containing species is located in the chamber for from about 1 minute to about 3 minutes. When the reactor is a plasma reactor, a plasma is provided in the plasma reactor to dissociate all of the halogen-containing species in the reactor with the dissociated species combining to form more energetically favorable species which are more environmentally friendly.