The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 21, 2003
Filed:
Jun. 13, 2002
Daniel R. Neal, Tijeras, NM (US);
Richard J. Copland, Albuquerque, NM (US);
WaveFront Sciences, Inc., Albuquerque, NM (US);
Abstract
A method of measuring aberrations of a three-dimensional structure of an optical system, such as an eye, includes creating a plurality of light beams, optically imaging the light beams and projecting the light beams onto different locations in an optical system, receiving scattered light from each of the locations, and detecting individual wavefronts of the scattered light. The plurality of light beams may be created and projected simultaneously or sequentially. A system for measuring aberrations of a three-dimensional structure of an optical system includes a light source creating a plurality of light beams, an optical imaging system optically imaging the light beams and projecting the light beams onto different locations in the target optical system, and a wavefront sensor receiving scattered light from each of the locations and detecting individual wavefronts of the scattered light.