The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 14, 2003
Filed:
Jun. 30, 2000
Alessandro Cesare Callegari, Yorktown Heights, NY (US);
Praveen Chaudhari, Briarcliff Manor, NY (US);
James Patrick Doyle, Bronx, NY (US);
Eileen Ann Galligan, Fishkill, NY (US);
Yoshimine Kato, Kanagawa, JP;
James Andrew Lacey, Mahopac, NY (US);
Shui-Chih Alan Lien, Briarcliff Manor, NY (US);
Minhua Lu, Mohegan Lake, NY (US);
Hiroki Nakano, Shiga, JP;
Shuichi Odahara, Kanagawa-Ken, JP;
International Business Machines Corporation, Armonk, NY (US);
Abstract
The present invention includes a method of forming an aligned film on a substrate. The film is deposited and aligned in a single step by a method comprising the step of bombarding a substrate with an ion beam at a designated incident angle to simultaneously (a) deposit the film onto the substrate and (b) arrange an atomic structure of the film in at least one predetermined aligned direction.