The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 07, 2003
Filed:
Aug. 17, 2001
Applicant:
Inventors:
Assignee:
ASM Japan K.K., Tama, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C23C 1/600 ; H01L 2/100 ;
U.S. Cl.
CPC ...
C23C 1/600 ; H01L 2/100 ;
Abstract
A compact single-wafer-processing semiconductor-manufacturing apparatus for processing semiconductor substrates is characterized in that at least two units, each of which comprises a reactor for growing a film on a semiconductor substrate and a load lock chamber for having the semiconductor substrate wait in a vacuum and which is directly connected with the reactor via a gate valve, are modularized and these modularized reactor units can be configured as a cluster through an atmospheric front end (AFE). Inside the load lock chamber, a substrate transfer mechanism comprising a thin link arm for transferring a semiconductor substrate into the reactor is provided.