The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 30, 2003
Filed:
Mar. 30, 2000
Haruyuki Nakano, Shiga, JP;
Wen Jye Chang, Shiga, JP;
NEC Machinery Corporation, Tokyo, JP;
Abstract
Based on the result of image recognition of the first wafer, the scan area of image recognition in the second and later wafers is determined. For example, in an appearance inspection process of semiconductor pellets, the first wafer is scanned over for image recognition to determine a contour (hereinafter referred to as the polygon) of a set constituted by pellets excluding non-shaped pellets as the scan area for the second and later wafers. This allows for reducing the scan area for the second and later wafers, thereby eliminating unnecessary areas to scan and saving time and costs required for the work.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile