The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 30, 2003
Filed:
Mar. 18, 1999
Kenji Nagao, Yokohama, JP;
Masaki Soma, Yokohama, JP;
Matsushita Electric Industrial Co. Ltd., Osaka, JP;
Abstract
A plurality of teaching identification face image patterns of teaching persons are obtained in a first pattern obtaining process using an image scanner, and a plurality of teaching video face image patterns of the teaching persons are obtained in a second pattern obtaining process using a video camera. A feature extraction matrix, which minimizes an overlapping area between a pattern distribution of the teaching identification face image patterns and a perturbation distribution between a group of teaching identification face image patterns and a group of teaching video face image patterns, is calculated. In cases where a feature extraction using the feature extraction matrix is performed for referential face image patterns of registered persons obtained in the first pattern obtaining process, referential feature pattern vectors independent of any pattern obtaining process are obtained. When an input face image pattern of a specific person obtained in the second pattern obtaining process is received, the feature extraction is performed for the input face image pattern to obtain an input feature pattern vector independent of any pattern obtaining process. Therefore, the specific person can be recognized as a specific registered person by selecting a specific referential feature pattern vector most similar to the input feature pattern vector.