The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 30, 2003

Filed:

Aug. 19, 2002
Applicant:
Inventors:

Chien-Hung Liu, Taipei, TW;

Shyi-Shuh Pan, Kaohsiung, TW;

Shou-Wei Huang, Chilung, TW;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 2/18247 ;
U.S. Cl.
CPC ...
H01L 2/18247 ;
Abstract

A method of fabricating a nitride read only memory. A trapping dielectric sandwiched structure, including an insulation layer, a charge trap layer and an insulation layer, is formed on a substrate. An opening with indented sidewalls is formed in the insulation layer. A thermal oxide layer is formed to fill the opening, such that the indented sidewalls are completely sealed. The charge trap layer is thus sealed by the insulation layers and the thermal oxide layer to avoid the direct contact between the control gate and the charge trap layer, so as to prevent the data loss.


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Liu, Chien-Hung. (2003). Method of fabricating nitride read only memory (U.S. Patent No. 6627500). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6627500

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