The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 30, 2003
Filed:
Aug. 13, 1999
Günther Schindler, München, DE;
Walter Hartner, München, DE;
Infineon Technologies AG, Munich, DE;
Abstract
A process for producing structured layers on a base body, in particular a semiconductor body, includes the steps of providing a first layer, structuring the first layer with a partial or complete local layer erosion to form raised and recessed layer regions, and depositing a second layer. The structured first layer is a provided as a permanently remaining layer. Edges are formed at transitions from raised to recessed layer regions. The height difference at the edges of the structured first layer separates individual layer regions of the second layer. The edges of the raised regions act as partition edges for the second layer. A process for producing components of an integrated circuit and a process for producing a memory configuration are also provided.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile