The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 23, 2003
Filed:
Oct. 18, 2000
Applicant:
Inventors:
Daniel R. Neal, Tijeras, NM (US);
Daniel R. Hamrick, Cedar Crest, NM (US);
Thomas D. Raymond, Sandia Park, NM (US);
Assignee:
WaveFront Sciences, Inc., Albuquerque, NM (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01B 1/130 ;
U.S. Cl.
CPC ...
G01B 1/130 ;
Abstract
A metrology system and method uses pulsed light to allow continuous movement of a target relative to the sensor. A metrology system and method uses dynamic adjustment of tilt in a system. A metrology system and method calibrates the system to remove inherent optical aberrations in the system. Filtering may also be used in the system to increase accuracy.