The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 16, 2003
Filed:
Sep. 28, 2001
Applicant:
Inventors:
Günther Czech, Langebrück, DE;
Wolfgang Henke, Dresden, DE;
Carsten Fülber, Dresden, DE;
Assignee:
Infineon Technologies AG, Munich, DE;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03F 9/00 ; G03F 7/20 ;
U.S. Cl.
CPC ...
G03F 9/00 ; G03F 7/20 ;
Abstract
The photomask and the associated method of lithography and mask technique enable production of a regular configuration of resist dots or holes. At least one photomask is a phase mask. The method is useful for the production of magnetic memory components, in particular MRAM memories, having elliptically shaped magnetic memory elements of high density.
Quick Actions:
Czech, Günther. (2003). Photomask, method of lithographically structuring a photoresist layer with the photomask, and method of producing magnetic memory elements (U.S. Patent No. 6620559). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6620559
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile