The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 02, 2003

Filed:

Mar. 05, 2001
Applicant:
Inventors:

Yoshihiro Nakata, Kawasaki, JP;

Shun-ichi Fukuyama, Kawasaki, JP;

Katsumi Suzuki, Kawasaki, JP;

Ei Yano, Kawasaki, JP;

Tamotsu Owada, Kawasaki, JP;

Iwao Sugiura, Kawasaki, JP;

Assignee:

Fujitsu Limited, Kawasaki, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C08L 8/304 ;
U.S. Cl.
CPC ...
C08L 8/304 ;
Abstract

A low dielectric film forming material contains siloxane resin and polycarbosilane dissolved in solvent. By using this solution, a low dielectric film is formed which contains siloxane resin and polycarbosilane bonded to the siloxane resin. Material of a low dielectric film is provided which is suitable for inter-level insulating film material. A semiconductor device is also provided which has a low dielectric constant film and high reliability.


Find Patent Forward Citations

Nakata, Yoshihiro. (2003). Low dielectric constant film material, film and semiconductor device using such material (U.S. Patent No. 6613834). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6613834

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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