The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 02, 2003
Filed:
Sep. 13, 2000
Applicant:
Inventors:
Hiroshi Yano, Tokyo, JP;
Koji Asano, Tokyo, JP;
Assignee:
Advantest Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 9/00 ;
U.S. Cl.
CPC ...
G03F 9/00 ;
Abstract
A member adopted to be irradiated with a charged beam in an oxidizing atmosphere in a charged beam processing apparatus; comprising: a region which is to be irradiated with the charged beam, which is covered by a conductive and not oxidizable material or a material that becomes a conductive oxide when said material is oxidized.
Yano, Hiroshi. (2003). Member used for charged beam processing apparatus, and mask (U.S. Patent No. 6613482). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6613482
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile