The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 26, 2003
Filed:
Oct. 10, 2001
Applicant:
Inventors:
Assignee:
Anelva Corporation, Fuchu, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 1/402 ;
U.S. Cl.
CPC ...
C23C 1/402 ;
Abstract
In a device for forming magnetic film which deposits magnetic material on a substrate , a device is provided which, before the magnetic film is formed in a magnetic film-forming chamber , cleans one or both of the film-forming face and reverse face of the substrate in a cleaning processing chamber . The cleaning mechanism carries out cleaning by placing a substrate on a horseshoe-shaped insulator substrate-holding part which moves up and down, and emission of gas from the reverse face of the substrate and the like is brought about by generating Ar plasma between the upper periphery of the substrate, the substrate and a lower insulator of the substrate.