The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 19, 2003

Filed:

Aug. 19, 2002
Applicant:
Inventors:

Cheng-Jye Liu, Taoyuan Hsien, TW;

Tai-Liang Hsiung, Hsinchu, TW;

Chia-Hsing Chen, Hsinchu, TW;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G11C 1/604 ;
U.S. Cl.
CPC ...
G11C 1/604 ;
Abstract

The present invention provides a method for operating a NROM device, where the source and drain are surrounded by a heavy doping. When programming the NROM device, a more positive source bias and a more negative substrate bias is used to increase the body effect of the substrate for reducing the current require for Channel Hot Electron Injection (CHEI) programming. Furthermore, before erasing the NROM array, a pre-programming operation is performed to program every single memory cell of the NROM array to the written state for preventing over-erasing of the memory cells.


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