The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 05, 2003
Filed:
May. 18, 2001
Mohan Chandra, Merrimack, NH (US);
David J. Mount, North Andover, MA (US);
Michael A. Costantini, Hudson, NH (US);
Heiko D. Moritz, Nashua, NH (US);
Ijaz Jafri, Nashua, NH (US);
Jim Boyd, Amherst, NH (US);
Rick M. Heathwaite, Manchester, NH (US);
S.C. Fluids, Inc., Nashua, NH (US);
Abstract
A dry process for the cleaning of precision surfaces such as of semiconductor wafers, by using process materials such as carbon dioxide and useful additives such as cosolvents and surfactants, where the process materials are applied exclusively in gaseous and supercritical states. Soak and agitation steps are applied to the wafer, including a rapid decompression of the process chamber after a soak period at higher supercritical pressure, to mechanically weaken break up the polymers and other materials sought to be removed, combined with a supercritical fluid flush to carry away the loose debris.