The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 29, 2003
Filed:
Nov. 30, 1999
Eric Anthony Perozziello, Half Moon Bay, CA (US);
Guanyuan Michael Yu, San Jose, CA (US);
The Board of Trustees of the Leland Stanford Junior University, Stanford, CA (US);
Abstract
Currently semiconductor processing and device manufacturing relies heavily on continued scaling of critical dimensions for cost reduction and performance enhancement. In order to continue this scaling below 0.1 micron with acceptable manufacturing yields, reliable measurement of electrical charge distribution and the placement of dopants is essential, yet no conventional technique exists to obtain distortion-free cross-sectional images. An aspect of the invention relates to a technique for forming a precisely-located, substantially atomically smooth cross-section of a crystalline sample suitable for Scanning Capacitance Microscopy analysis. Another aspect of the invention provides a method for deconvolving Scanning Capacitance raw data into an accurate representation of electrical carrier distributions suitable for the higher resolution attainable with the new sample preparation technique.