The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 22, 2003
Filed:
Apr. 17, 2000
Applicant:
Inventors:
Michael J. M. Renkens, Geleen, NL;
Adrianus G. Bouwer, Nuenen, NL;
Johannes C. Driessen, Eindhoven, NL;
Theodorus H. J. Bisschops, Eindhoven, NL;
Hermanus M. J. R. Soemers, Mierlo, NL;
Jakob Vijfvinkel, Eindhoven, NL;
Assignee:
ASML Netherlands B.V., Veldhoven, NL;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B 2/762 ; G03B 2/758 ; G03B 2/742 ;
U.S. Cl.
CPC ...
G03B 2/762 ; G03B 2/758 ; G03B 2/742 ;
Abstract
A lithographic apparatus for step-and-scan operation has a three stage structure for the wafer stage. During step-and-scan operation, the long-stroke stage is moved steadily along the row or column of dies to be exposed sequentially. An intermediate scanning stage moves in a figure-of-eight motion relative to the long-stroke stage so that the net movement of the fine stage, which is carried by the scanning stage, is a meander path.