The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 15, 2003

Filed:

Aug. 04, 1998
Applicant:
Inventors:

Ajit Paranjpe, Sunnyvale, CA (US);

Peter Schwartz, Fremont, CA (US);

Jacques Kools, Fremont, CA (US);

Kang Song, Fremont, CA (US);

Dorian Heimanson, Foster City, CA (US);

Mehrdad Moslehi, Los Altos, CA (US);

Assignee:

Veeco-CVC, Inc., Fremont, CA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C23C 1/434 ;
U.S. Cl.
CPC ...
C23C 1/434 ;
Abstract

A dual collimation deposition apparatus and method are disclosed in which the dual collimation apparatus includes at least a long-throw collimator in combination with one or more physical collimators. A new physical collimator and shield design are also disclosed for improved process uniformity and increased equipment productivity.


Find Patent Forward Citations

Paranjpe, Ajit. (2003). Dual collimated deposition apparatus and method of use (U.S. Patent No. 6592728). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6592728

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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