The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 08, 2003
Filed:
Jul. 24, 2000
Jau-Hu Lee, Taipei, TW;
Chih-Kung Lee, Taipei, TW;
Shuen-Chen Shiue, Taipei, TW;
Shu-Sheng Lee, Taipei, TW;
Jiun-Yan Wu, Taipei, TW;
National Science Council, Taipei, TW;
Abstract
A method and apparatus is claimed for measuring the distance between a slider and a transparent disk with sub-nanometer resolution. The flying height is measured by applying ellipsometry. The measurement is done by: providing a sampling light beam with adjustable initial polarization state by phase modulation, and with variable incident angles relative to the air film and reflecting the sampling light off of the specimen at a detection site forming a reflected light beam that is then reflected at the detection site again and then guided to both detectors for detecting the intensity and phase change of the light beam to determine the gap's thickness as well as passing some light to a microscope used for observation of the detecting site on the specimen.