The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 08, 2003
Filed:
Mar. 23, 1999
Applicant:
Inventors:
Yoshinori Miwa, Utsunomiya, JP;
Yukio Yamane, Tokyo, JP;
Assignee:
Canon Kabushiki Kaisha, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B 2/752 ; G03B 2/742 ;
U.S. Cl.
CPC ...
G03B 2/752 ; G03B 2/742 ;
Abstract
An exposure apparatus includes an illumination system for illuminating a mask with an exposure beam having a wavelength of 250 nm or less, wherein a pattern of the mask can be lithographically transferred to a substrate through the illumination by the illumination system, a conditioning system for circulating an inside gas of the exposure apparatus and a control system for performing at least one of ozone removal and ozone detection, for ozone in the gas circulated.