The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 08, 2003

Filed:

Oct. 10, 2001
Applicant:
Inventors:

Shin Su, Taipei, TW;

Chun-Hsiang Lai, Taichung, TW;

Meng-Huang Liu, Hsinchu, TW;

Tao-Cheng Lu, Kaohsiung, TW;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 2/362 ; H01L 2/900 ; H01L 2/974 ;
U.S. Cl.
CPC ...
H01L 2/362 ; H01L 2/900 ; H01L 2/974 ;
Abstract

An electrostatic discharge (ESD) protection structure is disclosed. The ESD protection structure of the present invention uses a resistance capacitance (RC) circuit to distinguish an overshoot phenomenon caused by the instantaneous power-on from an ESD event, so as to prevent the ESD protection device, such as a P-type modified lateral silicon controlled rectifier (MLSCR), from being triggered unexpectedly by an overshoot phenomenon which results from the power-on under normal operation, and thereby the efficiency of the ESD protection device is promoted.


Find Patent Forward Citations

Su, Shin. (2003). Electrostatic discharge protection structure (U.S. Patent No. 6590261). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6590261

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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