The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 08, 2003
Filed:
Nov. 30, 2000
Tokyo Electron Limited, Tokyo-To, JP;
Abstract
This substrate processing device is identical to a wafer cleaning device for cleaning a wafer W, which includes a supply nozzle for supplying APM and the pure water, a spin chuck for carrying the wafer W and a container for accommodating the spin chuck . The container includes an inner processing chamber and an outer processing chamber and is constructed so as to be movable up and down to the spin chuck . A first drainage line is connected to the inner processing chamber to discharge APM and the interior atmosphere, while a second drainage line is connected to the outer processing chamber to discharge pure water and the interior atmosphere. With the connection of the first drainage line , the wafer cleaning device is adapted so that the supply nozzle supplies APM to a surface of the wafer W again. Therefore, it is possible to reuse this processing liquid advantageously and additionally, an exhaust displacement can be reduced.